Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc.
High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target
High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.
Uniform grain: Controlled grain size and direction
Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.
Rotary sputtering targets, often referred to as rotary targets or rotatable sputtering targets, are increasingly used in magnetron sputtering systems for enhanced efficiency and uniformity. A rotary sputter target, due to its cylindrical design, allows for better material utilization compared to traditional planar targets. Rotatable targets are particularly beneficial in large-scale production, where consistent coating quality is essential.
Acetron, founded in 2002, specializes in leading-edge PVD coating materials, providing highly pure materials for the most demanding coating processes. With over 20 years of experience, we focus on optimizing PVD technology, which is recognized as a sustainable solution that significantly reduces CO2 emissions. Our products, including sputtering targets and evaporation materials, serve diverse industries such as optics, automotive, energy, and medical applications, supporting OEM/ODM needs with accurate tolerances and stable quality. Our commitment to excellence is backed by certifications from our in-house laboratory and international authorities, including ISO9001, IATF16949, ISO14001, and ISO45001. We utilize advanced equipment like SEM, GDMS, and vacuum technology, and we have developed a large automatic bonding production line for sputtering targets, reinforcing our position as a leader in the coating materials industry.
Manufacturing processes
Manufacturing processes depend on the properties of the target material and its application.
We have (Vacuum melting, Rolling, Vacuum spraying, Atmospheric spraying, Vacuum hot pressing, Hot Isostatic Pressing (HIP), Cold Isostatic Pressing +Various atmosphere sintering technology, Low temperature metal, Vacuum hot pressing sintering technology, Electron beam melting, Zone melting purification, Vacuum directional solidification technology, etc).
For metal and alloy target, we adopt Vacuum melting, Rolling, Low temperature metal,Vacuum hot pressing sintering, Electron beam melting, Zone melting purification, Vacuum directional solidification technology.
Both Planar and Rotary target available
Planar target
Planar targets mainly refer to circular targets and rectangular targets with certain thickness. The plane target material is connected with sputtering equipment by means of thread, the sputtering film layer is attached to the substrate under vacuum conditions, and then the film is processed by various methods to meet different needs.
Rotary target
Rotary target is a magnetically controlled target. The target is shaped like a cylinder containing a stationary magnet for rotation. Its advantage is high utilization rate, the disadvantage is high cost.
Reference size
* Maximum sizes of planar target
Thickness: 30mm (can be 60mm for round target)
Width: max 2000mm
Length: max 4000mm
* Maximum sizes of rotary target
Vacuum/Air Spraying
Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm
Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm
Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm
Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm
Bonding
Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm
* Maximum sizes of planar target
Thickness: 30mm (can be 60mm for round target)
Width: max 2000mm
Length: max 4000mm
* Maximum sizes of rotary target
Vacuum/Air Spraying
Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm
Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm
Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm
Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm
Bonding
Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm
Planar/Rotary target can be customized as per your request.
| Chemical Formula | Purity | Forms | Specification |
| Al | 99.99% / 99.999% / 99.9995% | Planar / Rotary | Customized |
| Ag | 99.99% / 99.995% / 99.999% | Planar / Rotary | Customized |
| Au | 99.99% / 99.999% | Planar | Customized |
| Cu | 99.97% / 99.99% / 99.999% | Planar / Rotary | Customized |
| Cr | 99.5% / 99.95% | Planar / Rotary | Customized |
| C | 99.99% | Planar / Rotary | Customized |
| Co | 99.9% | Planar | Customized |
| Fe | 99.99% | Planar | Customized |
| Ge | 99.999% | Planar | Customized |
| Hf | 99.9% | Planar | Customized |
| In | 99.99% | Planar / Rotary | Customized |
| Mg | 99.99% | Planar | Customized |
| Mo | 99.95% | Planar / Rotary | Customized |
| Nb | 99.95% | Planar / Rotary | Customized |
| Ni | 99.9% / 99.99% | Planar | Customized |
| Si | 99.99% / 99.999% | Planar / Rotary | Customized |
| Sc | 99.99% | Planar | Customized |
| Sn | 99.99% | Planar / Rotary | Customized |
| Ta | 99.99% | Planar / Rotary | Customized |
| Ti | 99.6% / 99.99% / 99.995% | Planar / Rotary | Customized |
| W | 99.95% | Planar | Customized |
| Zr | 99.60% | Planar / Rotary | Customized |
Product classification
Core competencies
Brand advantage
Strategic advantage
R & D and talent stock advantage
Supply chain advantage
Certificate
IATF16949
ISO9001
ISO14001
IATF16949-2016
IATF16949-2016
ISO45001-2018
ISO45001
Indium Tin Oxide for REACH225
