STOCK CODE: 300706

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  • Metal Material
  • Metal Material
  • Metal Material

Metal Material

ACETRON offers a wide selection of evaporation materials for all PVD processes. Our product range comprises dozens of evaporation materials including special mixtures, fluorides, oxides, sulfides and metals. They are available in various forms including granules, tablets and purities in quantities ranging from several grams to hundreds of kilograms. Our extensive manufacturing capabilities allow us to custom prepare nearly and material to your exact specification.

All evaporation materials are designed and manufactured to improve the quality and performance of your evaporation processes. Reproducibility of every single batch ensures that desired product characteristics can be repeatedly achieved in our customer’s evaporation processes.


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MaterialCAS #
 DensityPurityMelting PointType of EvaporationEvaporation Source(Typical)
●=very good, ○= possible
Specific Evaporation Conditions
特定蒸发条件
Film Transparency Range Typically UsedFilm Refractive Index @ 550nm
Transparent RangeRemarks
Origin of Value Uncertain
MeltingSublimationE-Gun
Crucible / Liner material
E-Gun
Boat material
PremeltingLow Residual PressureReactive GasSubstrate Temperature RangeIron or Plasma
Assistance
Low
μm
High
μm
Cu CrucibleW CrucibleMo CrucibleTa CrucibleC CrucibleAl2O3BN CrucibleW BoatMo BoatTa Boat<100℃100-200℃200-300℃
Ag7440-22-410.49 g/cm³4N962 ℃

Special Guidelines









High-reflecting Coating Applications >0.4μmN/AN/AN/A
AgCu12249-45-510.20 g/cm³4N900 ℃




















0.12 @ 550nm
13 @ 10000nm
N/AFor high-reflective film coating&dielectric coating
Al7420-90-52.70 g/cm³5N660 ℃











High-reflecting Coating Applications >0.1μmN/AN/AFine Granules Can Be Deposited by Flash Technology
Au7440-57-519.32 g/cm³5N1064 ℃

Special Guidelines









High-reflecting Coating Applications: ~0.7-18 μmN/AN/AN/A
Cr7440-47-37.19 g/cm³3N51875 ℃
















3.18 350-9000nmAdhesion promotion. Structurable and filter coatings
Cu7440-50-88.96 g/cm³5N1084 ℃
















N/AN/AFine Granules Can Be Deposited by Flash Technology
Ge7440-56-45.35 g/cm³5N938 ℃










1.7234.20 1700-25000nmH-Index Material for IR applications
Hf7440-58-613.31 g/cm³3N52227 ℃











possible





N/AN/ADeporsiton of low absorbing HfO2 films requires ion plating technology and reactive pressure
Mg7439-95-41.73 g/cm³4N651 ℃
















N/AN/AN/A
Nb7440-03-18.57 g/cm³3N52468 ℃


















N/AN/AN/A
Ni7440-02-08.90 g/cm³5N1455 ℃














~1.77~6.44N/AN/AFilter
NiCr
(80:20wt%)
11106-97-18.40 g/cm³3N1430 ℃




















N/AN/AN/A
Si
(monocrystalline)
7440-21-32.33 g/cm³5N1410 ℃




















N/AN/AH-Index Material for IR applications
Sn7440-31-57.36 g/cm³5N232 ℃
















N/AN/AN/A
Ta7440-25-716.65 g/cm³3N52996 ℃



















N/AN/AN/A
Ti7440-32-64.50 g/cm³5N1660 ℃
















N/AN/AN/A
V7440-62-26.00 g/cm³3N1890 ℃

















N/AN/AN/A
W7440-33-719.40 g/cm³3N53420 ℃



















N/AN/AN/A
Y7440-65-54.50 g/cm³3N1522 ℃


















N/AN/AN/A
Yb7440-64-47.00 g/cm³4N5824 ℃




















N/AN/AN/A
Zn7440-66-67.10 g/cm³4N420 ℃
















N/AN/AN/A
Zr7440-67-76.50 g/cm³3N51852 ℃
















N/AN/AN/A

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Certificate

  • IATF16949

    IATF16949

  • ISO9001

    ISO9001

  • ISO14001

    ISO14001

  • IATF16949-2016

    IATF16949-2016

  • IATF16949-2016

    IATF16949-2016

  • ISO45001-2018

    ISO45001-2018

  • ISO45001

    ISO45001

  • Indium Tin Oxide for REACH225

    Indium Tin Oxide for REACH225