ACETRON offers a wide selection of evaporation materials for all PVD processes. Our product range comprises dozens of evaporation materials including special mixtures, fluorides, oxides, sulfides and metals. They are available in various forms including granules, tablets and purities in quantities ranging from several grams to hundreds of kilograms. Our extensive manufacturing capabilities allow us to custom prepare nearly and material to your exact specification.
All evaporation materials are designed and manufactured to improve the quality and performance of your evaporation processes. Reproducibility of every single batch ensures that desired product characteristics can be repeatedly achieved in our customer’s evaporation processes.
Material | CAS # | Density | Purity | Melting Point | Type of Evaporation | Evaporation Source(Typical) ●=very good, ○= possible | Specific Evaporation Conditions | Film Transparency Range Typically Used | Film Refractive Index @ 550nm | Transparent Range | Remarks Origin of Value Uncertain | |||||||||||||||||
Melting | Sublimation | E-Gun Crucible / Liner material | E-Gun Boat material | Premelting | Low Residual Pressure | Reactive Gas | Substrate Temperature Range | Iron or Plasma Assistance | Low μm | High μm | ||||||||||||||||||
Cu Crucible | W Crucible | Mo Crucible | Ta Crucible | C Crucible | Al2O3 | BN Crucible | W Boat | Mo Boat | Ta Boat | <100℃ | 100-200℃ | 200-300℃ | ||||||||||||||||
Al2O3 | 1344-28-1 | 3.97 g/cm³ | 4N | 2054 ℃ | √ | ● | √ | √ | √ | √ | ~0.19 | ~7 | 1.62 | 200-5000nm | M-index material for NUV-VIS-NIR | |||||||||||||
CeF3 | 7758-88-5 | 6.20 g/cm³ | 4N | 1460 ℃ | √ | ● | ● | ● | ● | ● | √ | √ | √ | 0.3 | 13 | 1.62 | 300-5000nm | L-Index Material for IR applicatons | ||||||||||
LaF3 | 13709-38-1 | 6.00 g/cm³ | 4N | 1500 ℃ | √ | ● | ● | ● | √ | √ | √ | √ | 0.15 | 12 | 1.59 | 140-14000nm | H-Index Material for DUV applications | |||||||||||
La2O3+Al2O3 | 1312-81-8 1344-28-1 | 4.70 g/cm³ | 3N5 | 1900 ℃ | 1.69 | 170-9000nm | M-Index Material which has wider transparent range than Al2O3 | |||||||||||||||||||||
SiO | 10097-28-6 | 2.10 g/cm³ | 3N | 1700 ℃ | √ | ● | ● | ● | ● | √ | √ | √ | √ | 0.4 (partly oxidized film/Si2o3) 0.7 (Reduced film/SiO) | 8 8 | 1.85±0.03 | 700-9000nm | Adhesion Promoter and M-Index Material for VIS-NIR applications | ||||||||||
YF3 | 13709-49-4 | 4.01 g/cm³ | 4N | 1387 ℃ | √ | ● | ● | ○ | ○ | ● | ● | √ | √ | √ | √ | 0.19 | 12 | 1.59 | 220-14000nm | M-Index Material for IR applicatons | ||||||||
Y2O3 | 1314-36-9 | 5.01 g/cm³ | 4N | 2415 ℃ | possible | possible | ● | ● | ○ | √ | √ | √ | √ | <0.25 | 10~12 | 1.79 | 250-12000nm | M-index material and adhesion promoter for IR applications | ||||||||||
YbF3 | 13760-80-0 | 8.20 g/cm³ | 4N | 1160 ℃ | possible | possible | ● | ○ | ● | ● | √ | √ | √ | √ | possible | 0.2 Weak intrinsic film absorption band in the 0.9~1.0μm wavelength range 在0.9~1.0μm | 12 | 1.48 | 220-14000nm | L-Index Material for IR applicatons(High-power laser coatings) |
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