Rotary Alloy Sputtering Target

High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target

High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.

Uniform grain: Controlled grain size and direction

Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.

Rotary sputtering targets and rotary targets are essential components in advanced coating processes. These rotary sputter targets and rotary sputtering targets are designed to offer consistent performance, ensuring high-quality thin films. The use of rotatable sputtering targets and rotatable targets allows for efficient material utilization and uniform deposition, making them ideal for large-scale production in various industries. Contact us to learn more about our range of sputtering targets and how they can enhance your coating applications.